FIELD: chemistry.
SUBSTANCE: method of hydrogen fluoride purification from silicon fluoride and phosphorus includes passing a gaseous mixture, which contains fluorides of hydrogen, silicon, phosphorus, through sodium fluoride. The mixture contacts with sodium fluoride at a temperature of 20-40°C and pressure of 100-200 mm Hg until sodium polyhydrofluorides and complex fluorides of admixture elements are formed. After that, the temperature is increased to 55-70°C and the desorption of hydrogen fluoride is carried out.
EFFECT: invention makes it possible to increase the efficiency of purification with obtaining hydrogen fluoride, to reduce the energy consumption due to the reduction of the process temperature.
3 ex
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