METHOD OF FLOATING POTENTIAL MEASUREMENT IN PLASMA Russian patent published in 2015 - IPC G01R19/145 

Abstract RU 2555495 C2

FIELD: measurement equipment.

SUBSTANCE: invention relates to measurement equipment, represents a method to measure floating potential in plasma and may be used to diagnose parameters of gas discharge plasma. In realisation of the method two probes are placed inside a solenoid, dimensions of which are much less than plasma size, and its design provides for setting the potential of the first probe at the level of space potential in the place of its location. This is achieved by local magnetisation of electrons so that they may only arrive to the first probe by means of diffusion across lines of magnetic induction. At the same time the second probe is located under the floating potential, value of which is measured relative to the first probe potential, i.e. plasma potential.

EFFECT: measurement improvement.

2 dwg

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RU 2 555 495 C2

Authors

Abramov Aleksandr Vladimirovich

Dates

2015-07-10Published

2013-09-05Filed