LITHOGRAPHY SYSTEM, TRANSDUCER ELEMENT AND METHOD OF FABRICATION Russian patent published in 2015 - IPC H01J37/244 

FIELD: physics.

SUBSTANCE: system of lithography by elementary particles of charged particles for transfer of patter on target surface comprises pickup to determine several characteristics of one or several beams of charged particles. Said pickup comprises converter element (1) to receive charged particles (22) and generation of photons in response thereto. This converter element comprises the surface for reception of one or several beams of elementary beams of charged particles. Note here that said surface is provided with one or several cells for evaluation of one or several individual elementary beams. Every cell comprises preset interlocking pattern (18) of one or several interlocking structures for charged particles that make multiple cutting edges in transitions between interlocking areas and areas without interlocking along preset path of scanning of elementary beams over the converter element surface. Converter element surface is coated with coating ply (20), in fact, permeable for said charged particles and, in fact, impermeable for external light. Electrically conducting ply (21) is arranged between coating ply and interlocking structures.

EFFECT: higher accuracy of transducer.

26 cl, 3 dwg