SUBSTRATE FOR ELECTRONIC HIGH-RESOLUTION LITHOGRAPHY AND RELEVANT LITHOGRAPHY METHOD Russian patent published in 2017 - IPC G03F7/09 

FIELD: physics.

SUBSTANCE: base structure for the material layer intended for selective processing according to the high resolution pattern and the reception of the electronically sensitive masking layer for pattern determination comprises a layering of the substrate and an intermediate layer of the porous material with a density, at least, half that of the density of the same non-porous material, this material having an atomic mass of less than 32. The method of electronic lithography includes the formation of a base structure, for a layer of material intended for selective processing, according to a high resolution pattern, and then a processing operation by implanting and/or etching a layer of material intended for selective processing.

EFFECT: reducing the effect of backscattered electrons on high resolution images obtained by lithography.

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