FIELD: chemistry.
SUBSTANCE: target for ion-plasma sputtering is made on the basis of metal oxide and contains carbon. Concentration of carbon in target is selected on condition of provision at sputtering temperature of thermal effect from exothermic reaction in oxidation of carbon by metal oxide oxygen and free oxygen in sputtering zone, lower integral heat removal in said zone, and constitutes 0.1-20 at %. Metal oxide is represented by zinc oxide.
EFFECT: invention will make it possible to improve characteristics of applied layers, increase degree of target application and reduce energy consumption in the process of sputtering.
2 cl, 2 dwg
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