DEVICE FOR MAGNETRON APPLICATION OF LAYERS AND METHOD OF ITS USE Russian patent published in 2024 - IPC C23C14/35 C23C14/56 H01J37/317 H01J37/34 

FIELD: liquid atomisation or spraying devices.

SUBSTANCE: invention relates to a device for magnetron deposition of layers. Disclosed device comprises a vacuum chamber, a pumping system, a metered gas inlet system, a substrate holder, a substrate shutter, a holder with a target from a sprayed material, a cathode assembly, a source of negative bias voltage supplied to the target, and an electric capacitor. Shutter of the substrate is made with possibility of manual or automatic opening and closing. Electric capacitor is connected in parallel to the discharge gap. Device also comprises discharge current oscillation amplitude control means and means for setting discharge current oscillation amplitude threshold values, at which the possibility of manual or automatic opening of the shutter is provided for the material sprayed from the target onto the surface of the substrate, or the shutter closure.

EFFECT: prevention of sputtering from target material onto substrate until partial pressure of oxygen is reduced to preset level determined experimentally for each applied material, controlled by amplitude of discharge current oscillations.

1 cl, 1 dwg