FIELD: chemistry.
SUBSTANCE: invention relates to chemistry, in particular to production of high purity glass that can be used for manufacturing optical elements, waveguides and wide bandgap semiconductors used in optical and optoelectronic devices for near and middle infrared range. Task to be solved by invention development of a method of producing high-purity chalco-iodide glass, which reduces amount of impurities, coming from materials of equipment. Method of producing high-purity chalco-iodide glass comprises continuously feeding charge components into a flow plasma-chemical reactor, initiating interaction reaction of chalcogen and volatile iodides using plasma discharge, synthesis of glass-forming compounds is carried out in conditions of nonequilibrium plasma of high-frequency capacitive discharge at low pressure.
EFFECT: technical result of invention is reducing impurities in glass composition.
1 cl, 2 tbl, 2 ex
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