FIELD: electricity.
SUBSTANCE: invention can be used to form in superconducting thin films of areas with required values of critical current density. This invention consists in that the method of forming areas of variable-depth superconducting thin film by laser sputtering YBa2Cu3O7-x, where between the target and the substrate is placed shadowing plate, then target laser radiation power density Ρ=(1÷2)·109 W/cm2, wavelength λ=1.06 MCM, pulse duration τ=10÷20 ns and pulse repetition frequency ν=10 Hz for time t=175÷185 s at a temperature of target Tm= 600÷700°c, substrate temperature Tu=800÷840°C, distance between the substrate and shading plate L=0.1÷0.2 mm, at that outside the shading plate a superconducting film thickness D2=160÷200 nm with critical current density j>106 A/cm2, and under the shading plate a superconducting film thickness D2=40-50 nm with critical current density j=(1÷5)·103 A/cm2.
EFFECT: simplified technology of producing microbridges of superconducting film with required values of critical current.
1 cl, 3 ex, 4 dwg
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Authors
Dates
2016-04-10—Published
2015-02-02—Filed