METHOD FOR ELECTRONIC DEGASSING MICROCHANNEL PLATE DURING MANUFACTURE OF VACUUM DEVICE Russian patent published in 2016 - IPC H01J9/12 

FIELD: electronics.

SUBSTANCE: invention relates to electronic engineering, particularly to production of vacuum photoelectronic devices containing microchannel plates (MCP), such as biplanar and inversion electro-optical converters (EOC), photo multipliers (PMT) and position-sensitive detectors, and can be used in production of said devices. Method involves exposing microchannel plate to input electron flux at specified voltage and output current. Degassing is performed with electron flux in five steps: first step is carried out at input current 4·10^-9-8·10^-9 Α and output current 0,05-0,1 of conduction current of microchannel plate, second step of degassing is carried out at voltage on microchannel plate of 1,000-1,050 V at same input current, third step comprises gradually reducing voltage on microchannel plate every 50-100 V from 1,000-1,050 V to 650-600 V with continuously maintained output current 2.7-3.2 mcA, fourth step of degassing is carried out at same output current and input current corresponding to input current of limiting mode of operation of vacuum device, fifth step of degassing is carried out at voltage on microchannel plate of 1,000-1,050 V and output current 10-12 mcA.

EFFECT: technical result is increased productivity and efficiency of degassing microchannel plate to improve parameters and reliability of vacuum device.

1 cl, 2 dwg, 2 tbl