METHOD OF PRODUCING THIN NANOCRYSTALLINE INTERMETALLIC FILM ON GLASS SUBSTRATE Russian patent published in 2016 - IPC C23C14/18 B82B3/00 C23C14/24 C23C14/58 

FIELD: physics.

SUBSTANCE: invention relates to physics of nanosized structures, namely a method of producing thin metal films, which can be used as test objects of optical devices. Method of producing a thin nanocrystalline film of Ni-Al system on a glass substrate involves application by condensation in vacuum of metal layers on the glass substrate and synthesis of the intermetallic compound, herewith at least six layers are applied on the glass substrate in the sequence of Ni/Al/Ni/Al/Ni/Al in vacuum at the residual pressure of not less than 10^-5 torr with the thickness of each layer from 30 to 60 nm, and synthesis of the intermetallic compound is carried out by means of relaxation annealing in vacuum by stepped heating at the rate of 1 deg/sec within the temperature range from 20 to 300 °C until obtaining a thin nanocrystalline film with the specified density of the intermetallic phase.

EFFECT: invention is aimed at creation of nanostructured thin films with controlled density of the intermetallic phase distribution.

1 cl, 6 ex, 4 tbl, 6 dwg