FIELD: chemistry.
SUBSTANCE: composition for selective etching of cadmium-mercuric telluride contains the ingredients in the following ratio, in volume fractions: 25% aqueous solution of chromium oxide (VI) (CrO3) - 24, concentrated hydrochloric acid (HCl) - 1, 5% solution of citric acid - 8.
EFFECT: selective etching of cadmium-mercuric telluride with the formation of triangular etch pits.
2 dwg
Authors
Dates
2017-05-15—Published
2016-06-06—Filed