METHOD OF PERMALLOY FILMS Ni Fe ELECTROCHEMICAL LOCAL DEPOSITION FOR THE INTEGRATED MICROSYSTEMS Russian patent published in 2017 - IPC C25D3/56 

FIELD: metallurgy.

SUBSTANCE: method involves the electrochemical deposition of permalloy films in the galvanic bath with vertical arrangement of electrodes at the constant current with the chloride electrolyte stirring, which contains the nickel and iron atoms at the ratio of concentrations N_Ni/N_Fe=4.26, corresponding to the composition of the alloy, the addition of the hydrochloric acid is introduced to obtain pH=1.7±10% in the electrolyte with the temperature 60-70°C, and deposition is carried out at the current density of 20±1.0 mA/cm² in the local areas, bounded by the photoresist mask at the oxidized silicon wafer, the surface of which is metallized by nickel with the nichrome sub-layer. The cathode and anode are the sheets of nickel foil and the cathode contacts to the metallized layer at the edge of the wafer.

EFFECT: production of permalloy films with the thickness of about 10 mcm by reducing the mechanical stresses in the film and improved magnetic properties without high-temperature annealing.

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