FIELD: chemistry.
SUBSTANCE: method for determining the average thickness of the oxide film during the anodic oxidation of a cold cathode in a glow oxygen discharge, including the creation of a high vacuum in the control region, is characterized in that the area of the working surface of a certain cold cathode configuration is determined, the internal volume of the vacuum region occupied by a vacuum sensor located outside the region of the cold cathode and a connected vacuum channel with a vacuum region containing a cold cathode process device, an internal volume of the vacuum region occupied by the cold cathode process device, the vacuum system and the vacuum region are filled with oxygen to a constant pressure, the vacuum region is disconnected from the vacuum system, the magnitude of the steady-state pressure is recorded in the vacuum regions containing the vacuum sensor and the cold cathode process device before the ignition of the glow discharge in the cold cathode process device, the glow discharge is lit in the internal volume of the vacuum region occupied by the cold cathode process device, the oxygen pressure is fixed by the vacuum sensor in the selected time during the anodic oxidation of a cold cathode in a glow discharge, the average thickness of the oxide film of aluminium is calculated on the working surface of the particular cold cathode configuration in the selected time during the anodic oxidation in a glow oxygen discharge according to the formula.
EFFECT: providing the possibility of determining the average thickness of the aluminium oxide film without disturbing the cathode structure.
1 cl
Title | Year | Author | Number |
---|---|---|---|
METHOD OF CREATING ANODE OXIDE FILM OF COLD CATHODE OF GAS LASER IN DIRECT CURRENT GLOW DISCHARGE | 2014 |
|
RU2581610C1 |
METAL-DIELECTRIC-SEMICONDUCTOR STRUCTURE BASED ON AB COMPOUNDS AND ITS FORMATION METHOD | 2010 |
|
RU2420828C1 |
METHOD OF PRODUCING OXIDE FILM OF COLD CATHODE OF GAS LASER IN GLOW DISCHARGE OF DIRECT CURRENT | 2019 |
|
RU2713915C1 |
PROCESS DEVICE FOR TREATMENT OF HOLLOW COLD CATHODE IN GAS DISCHARGE | 2013 |
|
RU2525856C1 |
METHOD OF MAKING HOLLOW COLD CATHODE FOR GAS LASER | 2010 |
|
RU2419913C1 |
METHOD FOR PRODUCING OF MIS STRUCTURES ON BASIS OF InAs | 2015 |
|
RU2611690C1 |
METHOD OF HELIUM-NEON LASER COLD CATHODE MAKING | 2015 |
|
RU2589731C1 |
METHOD OF ANODE FOIL OBTAINMENT | 2008 |
|
RU2391442C1 |
COLD CATHODE OF A GLOW DISCHARGE GAS DISCHARGE DEVICE | 2022 |
|
RU2786417C1 |
MANUFACTURING PROCESS FOR THIN-FILM ELECTRONIC MICRODEVICE | 1988 |
|
SU1729243A1 |
Authors
Dates
2017-08-14—Published
2016-04-27—Filed