LOW-TEMPERATURE ION-ARC SPUTTERING Russian patent published in 2017 - IPC C23C14/32 H01J37/32 

FIELD: technological processes.

SUBSTANCE: solid material of the arc evaporator, which acts as a cathode, is evaporated. During the arc evaporation, the movement of the cathode spot on the surface of the solid material is accelerated by a magnetic field to avoid the ejection of a large amount of particulates or droplets from the surface of the solid material. In the flow from the arc evaporator from the cathode to the anode, negatively charged particles are formed. They move from the cathode to the anode, which basically does not cause an additional increase in the absolute value of the potential difference between the cathode and the anode.

EFFECT: lower substrate temperature gain when sputtered.

10 cl, 9 dwg, 2 ex, 1 tbl