FIELD: technological processes.
SUBSTANCE: method of production comprises forming a selective layer of titanium with a thickness of 1-10 mcm on a porous substrate of stainless steel having a thickness of 150-250 mcm and an average pore size of 2-10 mcm. The selective layer is formed by purifying substrate with argon ions in a glow discharge in a vacuum chamber, followed by application of metallic titanium layer by magnetron ion-plasma sputtering. Application is carried out at pressure of 0.4-0.5 Pa, discharge current of 4-4.2 A, discharge voltage of 450-500 V to the required thickness of titanium layer.
EFFECT: increasing the maximum permissible operating temperature of obtained material in comparison with two-layer materials on organic substrate.
5 ex
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