HIGH-CURRENT SOURCE OF ION BEAMS BASED ON OF ELECTRON-CYCLOTRON RESONANCE DISCHARGE PLASMA HELD IN OPEN MAGNETIC TRAP Russian patent published in 2018 - IPC H01J27/16 

FIELD: physics.

SUBSTANCE: invention relates to means for forming a high-current ion beams by its extraction from a dense ECR discharge plasma created in an open magnetic trap by powerful radiation of a millimeter wavelength range. In the source of ion beam, system for formation and extraction of an ion beam from the plasma is autonomous, and provides the movement of plasma and accelerating electrodes relative to each other and relative to the magnetic system. Also, positioning system has been added to the beam formation and extraction system, providing the possibility of rotation of plasma and accelerating electrodes axis relative to the axis of the system and provides alignment of electrodes between each other and discharge vacuum chamber.

EFFECT: technical result is the possibility of forming on beams from a dense plasma with current up to an ampere ratio and an emittance value up to 0,01 π mm⋅mrad in normalized units, as well as the ability to regulate density of plasma flow that reaches the extractor, without changing parameters of plasma source.

3 cl, 2 dwg