FIELD: electrical engineering.
SUBSTANCE: invention relates to high voltage technology, in particular to the technique of electrical insulation in a vacuum, and can be used in high voltage power installations and electrovacuum devices to improve performance. Method for treating the electrodes is that the working surfaces of the electrodes of the insulating gaps are fused with concentrated plasma streams, followed by deposition of silicon-carbon films onto the surface of the electrodes with a low surface roughness and low emission activity 2.5–3 mcm thick in the plasma of a non-self-sustaining arc with a heated cathode using a silicone precursor-PFMS.
EFFECT: increase in the electrical strength of vacuum insulation of electrode gaps, achieved by deposition of a dielectric silicon-carbon film.
4 cl, 2 dwg, 1 tbl
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Authors
Dates
2018-08-29—Published
2017-11-10—Filed