FIELD: instrument engineering.
SUBSTANCE: invention relates to photoelectronic devices and can be used for making ion-barrier film on input surface of microchannel plate when producing photoelectronic devices. Method of making an ion-barrier film on a microchannel plate having a conductive electrode coating on its input surface includes depositing a thin polymer film on top of the conductive electrode coating, application of ion-barrier film over thin polymer film. Ion-barrier film is made thin of material with atomic weight of not more than 30, opaque for positive ions and transparent for ultraviolet radiation with wave length of not more than 250⋅10-9 meters. Ion-barrier film is irradiated with ultraviolet radiation with wavelength of not more than 250⋅10-9 meters in oxygen-containing medium at temperature not higher than 100 °C.
EFFECT: invention increases degree of electronic permeability of ion-barrier film during operation of microchannel plate in photoelectronic device.
7 cl
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Authors
Dates
2019-04-24—Published
2018-03-28—Filed