FIELD: medicine.
SUBSTANCE: invention relates to medicine. Method for preparing the intraosseous implant comprises preliminary mechanical treatment and cleaning of the titanium base. Surface of the endosseous portion of the implants is additionally treated in argon medium with a line scanning beam of a pulsed fiber laser with a radiation wavelength of 1.064 mcm, an output power of 20–30 Wt, with pulse repetition rate of 20–40 kHz, maximum pulse energy of 2.0–3.0 mJ and scanning speed of 100–150 mm/s, with laser spot size on processed surface of 10–15 mcm and line spacing of 5–10 mcm, with layer-by-layer evaporation of a certain part of titanium to form a given topography of the outer layer. Final passage with a laser beam is carried out on atmospheric air to form a porous layer of titanium dioxide. Then, implant surface is subjected to chemical etching in electrolyte solution with 500 ml HCl (density 1.19 g/ml); 500 ml of H2O; 170 g/l NH4F*HF at room temperature 25–30 °C with holding for 2–3 minutes, followed by washing in water and holding for 30–40 minutes in HNO3 solution (400 g/l) at temperature of 55–60 °C with subsequent washing in water, after which, finally, performing annealing in furnace at temperature of 400–550 °C in vacuum.
EFFECT: invention provides uniform distribution of chewing pressure on bone tissue and conditions for their more reliable primary and long-term fixation.
1 cl, 3 dwg
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Authors
Dates
2019-05-16—Published
2018-05-07—Filed