METHOD OF PHYSICAL DEPOSITION OF THIN FILMS OF METALS FROM GAS PHASE Russian patent published in 2019 - IPC C23C14/14 C23C14/30 

FIELD: technological processes.

SUBSTANCE: invention relates to a method for physical deposition from a gas phase obtained by electron-beam evaporation, a thin film consisting of silver crystallites, and can be used for production of devices requiring high-quality thin films of metals, in spheres of microelectronics, photonics, nano-plasmonics and quantum computing devices. Substrate working surface is prepared, the substrate is degassed in a vacuum and said physical deposition of the thin film from silver crystallites onto the working surface of the substrate. Said physical deposition of a thin film of silver crystallites is carried out at temperature T₁, which is in range of 4–250 K, then holding substrate in vacuum for period of time t_H in range of 2–24 hours at heating from temperature T₁ physical deposition of said thin film to temperature T₂, equal to room temperature.

EFFECT: higher aspect ratio of lateral sizes of thin film from silver crystallites to its thickness.

13 cl, 11 dwg, 2 ex