FIELD: metallurgy.
SUBSTANCE: manufacturing method of thin films of stoichiometric samarium monosulphide by pulse laser deposition involves deposition on substrate of thin films of samarium monosulphide in vacuum at room temperature using the target from stoichiometric SmS. After deposition of thin films of samarium monosulphide, annealing of the obtained films is performed in vacuum in the temperature range of 700-900 K. Films are applied to the substrate made from monocrystalline silicon with chemically removed natural oxide or made from amorphous material, or from optic glass, or from metal, or from organic material, or from acetyl cellulose. The target in the form of a pellet obtained by pressing of powder from stoichiometric SmS or the target that is made from monocrystal SmS or from polycrystal SmS is used.
EFFECT: obtaining the formed stoichiometric films of samarium monosulphide, which have improved optic, electric and mechanical properties.
3 dwg, 5 ex
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