FIELD: manufacturing technology.
SUBSTANCE: invention relates to a method of producing ferroelectric film Ba1-xSrxTiO3 and can be used for powerful super-high frequency equipment. At the first stage, target Ba0.4Sr0.6TiO3 on a silicon carbide substrate in an oxygen atmosphere at pressure of 2 Pa and a substrate temperature of 700–900 °C for a time sufficient to form a solid ferroelectric layer. At the second stage, the spraying process is stopped and the substrate temperature is increased for a time sufficient for annealing of the solid ferroelectric layer. After the annealing process is completed, the temperature of the substrate is reduced to the temperature of the first step. Other process parameters are not changed. Then, steps are repeated several times to obtain required depth of ferroelectric film.
EFFECT: technical result consists in production of ferroelectric film with high dielectric nonlinearity at low dielectric losses on substrate with high heat conductivity for powerful super-high frequency equipment.
1 cl, 2 dwg, 1 ex
Title | Year | Author | Number |
---|---|---|---|
METHOD FOR OBTAINING FERROELECTRIC FILMS BaSrTiO | 2017 |
|
RU2671614C1 |
METHOD OF OBTAINING SEGNETIC ELECTRIC FILM BaSrTiO | 2016 |
|
RU2619365C1 |
SOLID SOLUTIONS FERROELECTRIC FILMS PRODUCTION METHOD | 2018 |
|
RU2682118C1 |
SMALL-SIZED PHASE SHIFTER OF MICROWAVE RANGE | 2012 |
|
RU2510551C1 |
METHOD FOR PULSED-LASER PRODUCTION OF HIGH DIELECTRIC CONSTANT THIN-FILM MATERIALS | 2004 |
|
RU2306631C2 |
METHOD OF PRODUCING THIN EPITAXIAL LAYERS OF β-SIC ON MONOCRYSTALLINE SILICON | 2013 |
|
RU2524509C1 |
METHOD OF PRODUCTION OF PHOTOSENSITIVE RESISTIVE AND OPTICALLY NONLINEAR THIN-FILMED HETEROSTRUCTURES BASED ON SEMICONDUCTOR AND DIELECTRIC MATERIALS | 1993 |
|
RU2089656C1 |
METHOD FOR SYNTHESISING NANOCRYSTALLINE SILICON CARBIDE FILMS ON A SILICON SUBSTRATE | 2022 |
|
RU2789692C1 |
THIN-FILM FERROELECTRIC CAPACITOR | 2013 |
|
RU2550090C2 |
METHOD FOR PRODUCTION OF THIN SILICON CARBIDE FILMS BY METHOD OF VACUUM LASER ABLATION | 2007 |
|
RU2350686C2 |
Authors
Dates
2019-09-23—Published
2019-02-07—Filed