FIELD: nanotechnologies.
SUBSTANCE: invention relates to micro- and nanotechnology and can be used for making arrays of submicron structures used in nanophotonics and nano-plasmon sensor devices to increase their sensitivity level. Method of producing arrays of regular submicron metal structures on optically transparent substrates involves preparing a working surface of an optically transparent substrate, applying a resistive layer on the working surface of the optically transparent substrate, beam exposure, manifestation with formation of mask in resistive layer and physical deposition of metal from gas phase. Formation of mask in resistive layer is carried out by three-level profiling of radiation dose, including first level of radiation with dose D1 of area of structure with area S1, second radiation level with dose D2 of structure area with area S2 along structure perimeter with area S1 and third radiation level with dose D3 of structure area with area S3 exceeding area equal to sum of S1 and S2, wherein radiation dose D3 is much less than radiation dose D1, a dose of D2 is more than dose D1. In particular cases of implementation of the invention after applying a resistive layer on the working surface of the optically transparent substrate, a conducting layer is applied on the resistive layer, which is removed before manifestation. Area of structure with area S1 is much larger than area of structure with area S2. Making said structures is carried out in vacuum conditions below 1×10-6 mbar. Electron-beam exposure is used as a radiation exposure. Metal deposition is carried out at temperature T1 in range from 150 to 450 K at a rate of not more than 5 nm/s.
EFFECT: reduced roughness of the edge of regular submicron metal structures and high repeatability of the produced arrays of said structures on optically transparent substrates.
6 cl, 6 dwg, 1 ex
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Authors
Dates
2019-11-15—Published
2019-04-02—Filed