FIELD: metallurgy.
SUBSTANCE: invention relates to electroplating and can be used for production of thin rhenium films, which can be used as a sublayer for subsequent electrodeposition. Electrolysis is carried out in a solution of hydrochloric acid with concentration of 200–350 g/l, containing rhenium compounds in terms of metal 0.5–10.0 g/l, while varying cathode current density within 0.1–1.0 A/cm2 in temperature range 25–40 °C.
EFFECT: obtaining rhenium films with lower process costs and reduced environmental load.
1 cl, 5 ex
| Title | Year | Author | Number |
|---|---|---|---|
| ELECTROLYTE FOR THE PRODUCTION OF RHENIUM FILMS | 2019 |
|
RU2749778C1 |
| METHOD OF ELECTROCHEMICAL PRODUCTION OF COMPACT LAYERS OF METALLIC RHENIUM | 2017 |
|
RU2677452C1 |
| ELECTROCHEMICAL METHOD OF OBTAINING CONTINUOUS LAYERS OF SILICON | 2012 |
|
RU2491374C1 |
| METHOD OF PRODUCING SEMIPERMEABLE MEMBRANES | 0 |
|
SU1560280A1 |
| METHOD FOR ELECTROLYTIC SYNTHESIS OF CESIUM HEXACHLORRENATE | 2019 |
|
RU2758363C2 |
| METHOD FOR DEPOSITION OF RHENIUM ON METAL BASE | 1993 |
|
RU2049826C1 |
| GRAPHENE, GRAPHENE FILMS AND COATINGS PRODUCTION METHOD | 2017 |
|
RU2675146C2 |
| MODIFYING METHOD OF TITANIUM SURFACE AND ITS ALLOYS | 2012 |
|
RU2496924C1 |
| VALUABLE METAL EXTRACTION PROCESS FROM SUPER-ALLOYS | 2002 |
|
RU2313589C2 |
| METHOD OF PERMALLOY FILMS Ni Fe ELECTROCHEMICAL LOCAL DEPOSITION FOR THE INTEGRATED MICROSYSTEMS | 2015 |
|
RU2623536C2 |
