FIELD: physics; chemistry.
SUBSTANCE: invention relates to physics and chemistry of surface and can be used for evaluation of physical and chemical processes occurring on surface of materials, in particular for evaluation of change of morphology of surfaces of semiconductor materials used in gas sensors, gas-sensitive and self-organizing materials during adsorption of inorganic and organic pollutant gases onto them. Method of assessing the effect of adsorbed gases on the surface of materials, involving obtaining an image of the analyzed surface by atomic force microscopy, obtaining distribution of value of average mutual information by its calculation method, classification of analyzed surface by value of entropy and degree of ordering, evaluation of material surface morphology by change of value of average mutual information is characterized by that analysis of materials surface by atomic-force microscopy is carried out in process of gas supply, influence of various supplied gas concentrations is assessed and critical concentration of adsorbing gas-contaminant is determined.
EFFECT: method of investigating change of morphology of surfaces of gas-sensitive and self-organizing materials during adsorption of inorganic and organic pollutant gases onto them.
1 cl, 1 dwg
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Authors
Dates
2020-01-31—Published
2019-04-17—Filed