INSTALLATION FOR VACUUM DEPOSITION OF COATINGS AND METHOD FOR COATING SUBSTRATE Russian patent published in 2021 - IPC C23C14/16 C23C14/24 C23C14/34 C23C14/56 

FIELD: mechanical engineering.

SUBSTANCE: invention relates to the technology of continuous deposition of coatings formed from a single metal or metal alloy. The method for continuous deposition on a moving substrate S of coatings formed of at least one metal inside a vacuum deposition unit 1 containing a vacuum chamber 2 includes a step in which, in the specified vacuum chamber, metal vapor is ejected through at least two steam ejectors 3, 3' in the direction to both sides of the moving substrate S, and a layer of at least one metal is formed on each side by condensation of the ejected vapors, with at least two steam ejectors 3, 3' facing each other, they are positioned respectively at the angles α and α' formed between the steam ejector and the axis A perpendicular to the direction of movement of the substrate, the axis of which is in the plane of the substrate S, and both angles α and α' satisfy the following equations:

where D1 and D2 are the distances between the ejectors 3, 3 and each edge of the substrate S along the axis A, Ws is the width of the substrate, the mentioned steam ejectors have a rectangular or trapezoidal shape and contain a slot determined by the width We of the slot, the mentioned steam ejectors have the same axis of rotation.

EFFECT: arrangement of the ejectors is such that the thermal profile along the width of the substrate is uniform, the elastic deformation profile along the substrate after metal deposition is symmetrical, therefore, the coated substrate has a high flatness.

18 cl, 6 dwg, 1 tbl