INSTALLATION FOR VACUUM DEPOSITION AND METHOD FOR COATING SUBSTRATE Russian patent published in 2021 - IPC C23C14/16 C23C14/24 C23C14/34 C23C14/56 

FIELD: mechanical engineering.

SUBSTANCE: invention relates to the technology of continuous coating of metal or metal alloy. A method for continuously applying coatings formed of at least one metal to a moving substrate S inside a vacuum deposition unit 1 containing a vacuum chamber 2 includes a step in which, in the said vacuum chamber 2, metal vapor is ejected through at least one steam ejector 3 to one side of the moving substrate S1 and a layer of at least one metal is formed on the said side by condensation of the ejected steam, while at least one steam ejector 3 is located at an angle α between the steam ejector 3 and the A axis, perpendicular to the direction of motion of the substrate S1, and the axis A is in the plane of the substrate S1, and the angle α satisfies the following equation: where α is greater than 0° in absolute value, D1 and D2 are the smallest distance between the ejector and each edge of the substrate along the A axis, W_s is the width of the substrate, D1 and D2 have a value of more than 0 mm, i.e. the edges of the ejector do not extend beyond the edges of the substrate, the said steam ejector has a rectangular or trapezoidal shape, contains a slot and is determined by the length of the slot Le and the width of the slot We.

EFFECT: location of the steam ejector is such that if it is necessary to deposit metal vapors only on one side of the substrate, the accumulation of metal on its opposite side is significantly reduced.

14 cl, 4 dwg, 1 tbl