MAGNETRON SPUTTERING APPARATUS Russian patent published in 2021 - IPC H01J27/04 H01J37/34 C23C14/35 

FIELD: spraying.

SUBSTANCE: invention relates to ion-plasma sputtering apparatuses in crossed magnetic and electric fields and can be used as basic sputtering equipment. In a magnetron sputtering apparatus containing a target constituting a glow discharge cathode, a magnetic system connected with the target, a vacuum chamber constituting a glow discharge anode, and a glow discharge power source connected by a negative pole with the target and by a positive pole with the vacuum chamber, the magnetic system is made in the form of an annular magnet adjacent to the target.

EFFECT: increase in the efficiency of using the equipment as part of a vacuum sputtering system in magnetrons and cathode deposition unit due to the increase in the overall operational life of the target, as well as structural simplification of the apparatus and increase in the reliability during operation.

1 cl, 2 dwg