FIELD: radiation detectors with selective sensitivity in infra-red region for development photosensitive devices. SUBSTANCE: sensor has p-type single-crystalline silicon substrate of higher than 20 Ohm-cm resistivity and n-type amorphous silicon layer of 1.6-2.0 mcm thickness formed on it, as well as resistive contacts for them. EFFECT: improved sensitivity. 2 dwg
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Authors
Dates
1997-06-27—Published
1995-06-28—Filed