FIELD: electrical engineering.
SUBSTANCE: invention relates to the field of electrical engineering, namely to a method for manufacturing a superconducting wire, and can be used in the manufacture of superconducting wires by reactive magnetron sputtering. To achieve the effect, metal oxide films of the superconducting wire are stably formed at a high rate by controlling reactions in the transition region of reactive magnetron sputtering, and the method includes forming a buffer layer containing an Al2O3 layer on the substrate, wherein the Al2O3 layer is formed by a reactive magnetron sputtering method, wherein the first oxygen gas is used as a reaction gas and a sputtering target made of aluminum metal, wherein the Al2O3 layer is formed with the supply of the first oxygen gas at a first concentration being the concentration of the first oxygen gas at which the Al emission intensity in the plasma near the surface of the sputtered target is not less than 25% and not more than 80% of the first reference value, and the first reference value is the Al emission intensity at which the concentration of the first gaseous oxygen is zero; and forming a superconducting layer over the buffer layer.
EFFECT: increasing the manufacturing speed of buffer layers of high critical superconducting wire.
11 cl, 14 dwg, 2 tbl, 4 ex
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Authors
Dates
2022-05-11—Published
2019-05-21—Filed