ANTI-REFLECTIVE COATING Russian patent published in 2022 - IPC G03F7/38 

FIELD: coatings.

SUBSTANCE: invention relates to the creation of anti-reflective coatings of a semiconductor substrate in the process of forming topological elements of microelectronic devices using photolithography. Anti-reflective coating for photolithography includes a film-forming polymer, a crosslinking agent, a thermal acid generator, and an organic solvent. A salt of dodecylbenzenesulphonic acid with an amine is used as a thermal acid generator, wherein the salt-forming amine contains aliphatic substituents with hydroxy groups by the general formula

wherein R¹=AlkOH; R², R³=Alk, AlkOH.

EFFECT: possibility of reducing the release of volatile substances during drying, raising the solvent resistance of the ARC film, reducing the free volume between macromolecules and the diffusion, leading to the creation of photoresist elements with better profile.

3 cl, 2 dwg, 2 tbl, 4 ex