FIELD: instrument engineering.
SUBSTANCE: invention relates to development and manufacture of photosensitive semiconductor devices based on GaAs. Method of manufacturing high-power pulsed photodetector operating in photovoltaic mode (with zero bias voltage), based on GaAs includes sequential growth by liquid phase epitaxy on an n-GaAs substrate of a n-AlxGa1-xAs layer at x=0.10–0.15, i-GaAs layer, p-GaAs layer and p-AlxGa1-xAs layer at x=0.2–0.3 at the beginning of growth and at x=0.09–0.16 in the near-surface region of the layer.
EFFECT: invention ensures possibility of creating GaAs-based pulsed photodetector operating in photovoltaic mode (without bias), with reduced capacity, increased speed and photosensitivity, and thereby increasing the efficiency of conversion of pulses of high-power laser radiation modulated in gigahertz frequency range.
5 cl, 4 dwg, 2 ex
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Authors
Dates
2018-12-26—Published
2018-02-21—Filed