FIELD: radio frequency engineering.
SUBSTANCE: invention can be used in the development and creation of high-power pulse generators in the high-frequency (HF) range. A method for manufacturing a gas-discharge chamber for a gas-discharge generator of high-frequency pulses with a set carrier frequency of generation, in which a gas-discharge chamber is manufactured for initiating high-current gas discharges with a hollow cathode at low pressure, moreover, a cavity is provided in the cathode of the chamber, open towards the anode; the geometric parameters of the cavity are selected arbitrarily and taken as a standard; a high-frequency pulse generator is mounted on the basis of a gas-discharge chamber containing a cathode with a reference cavity, and the carrier frequency of the pulse generation of this generator is experimentally measured; calculate the effective area by the formula Seff = Sref⋅ (ƒref/ƒset)4, where Sref is the surface area of the reference cavity, ƒref is the carrier frequency of the generation of pulses generated by a chamber containing a cathode with a reference cavity, ƒset is the specified carrier frequency at which it is required to provide RF generation; make a cathode with a cavity, the surface area of which is equal to the effective value of Seff, otherwise the form factor of the manufactured cathode with an effective cavity corresponds to the form factor of the cathode with a reference cavity; a cathode with an effective cathode cavity is mounted in a gas-discharge chamber, while manufacturing a gas-discharge chamber for a gas-discharge generator of high-frequency pulses with a given carrier frequency of generation.
EFFECT: increased accuracy of providing the specified value of the carrier frequency of the generation of a gas-discharge HF-generator based on a gas-discharge chamber without conducting a large number of experiments.
1 cl, 2 dwg
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Authors
Dates
2023-03-29—Published
2022-03-30—Filed