FIELD: ophthalmology.
SUBSTANCE: retinal neuroepithelial detachment is visualized, laser exposure power is selected, and laser applications are applied to the affected area of the retina using a Navilas 577s laser device generating laser exposure at a wavelength of 577 nm. The visualization of the detachment of the neuroepithelium is performed by non-contact photo registration in the redless color of the macular zone, capturing the upper and lower vascular arcades. Afterwards, appliques are applied close to each other over the entire area of retinal neuroepithelial detachment with the following parameters of subthreshold micropulse laser exposure: power 60–150 mW, pulse exposure 20 ms, micropulse mode duty cycle 5%, spot diameter 100 μm, number of appliques 900–1,500 pcs. The selection of the laser radiation power is carried out in a continuous mode by applying single applicators along the vascular arcades, starting from 60 mW, pulse exposure is 20 ms, spot diameter is 100 μm, step is 10 mW.
EFFECT: method allows to reduce the duration of treatment, as well as to increase the efficiency of treatment by improving visual functions, restore the correct anatomical structure of the retina, reduce the height and area of neuroepithelial detachment, and restore the foveolar profile.
1 cl, 3 ex, 6 dwg
