REACTIVE VAPOUR DOSING DEVICE Russian patent published in 2023 - IPC C23C16/455 C30B25/14 C23C16/513 C23C16/52 C23C16/54 C30B25/16 

FIELD: microelectronics.

SUBSTANCE: device for dosed supply of reactive vapours includes vacuum chamber 1, pumping module 3, at least one precursor vapor supply system 7, gas supply module 14 and controller 17. Vacuum chamber 1 is connected to plasma source 2 and comprises substrate holder 5 connected to heating unit 6. Pumping module 3 is connected by means of first valve 4 to vacuum chamber 1. Precursor vapor supply system 7 includes a precursor container 8 coupled to heater 9; tank 10 with precursor vapor connected to pressure sensor 11; to container 8 through second valve 12 and to plasma source 2 through third valve 13. Precursor vapor supply system 7 also comprises auxiliary gas source 19 connected to tank 10 via sixth valve 20. Gas supply module 14 is connected via fourth valve 15 to gas flow control module 16 connected to plasma source 2. In the first embodiment, tank 10 with precursor vapor includes a piston coupled to an electric drive with a stepper motor, whereas the inner surface of tank 10 and the piston are covered with an anti-adhesive film. In the second embodiment, tank 10 is made in the form of a bellows coupled with a pneumatic drive. In the third embodiment, tank 10 is made of a dielectric material and is coupled to an inductor connected through a matching device to an RF generator.

EFFECT: reduced precursor consumption.

1 cl, 4 dwg