FIELD: chemistry.
SUBSTANCE: invention can be used in the manufacture of high-quality thin coatings, in particular oxide coatings. A system for chemical precipitation of volatile precursor vapors contains reaction chamber 1 in the form of a vertically oriented cylinder, carousel substrate holder 2, a module for supplying reaction gases and a module for supplying ionized gases designed for cleaning and activating the substrate surface, a heater and vacuum pumping means. The module for supplying reaction gases includes gas distribution device 3 made in the form of a shower nozzle connected to lines 4 and 5 designed, respectively, for supplying reaction gases and an oxidizer. The shower nozzle is installed with the possibility of moving along the vertical axis of reaction chamber 1 using at least one linear actuator 6, plate 7 and bellows 8. Carousel substrate holder 2 is made in the form of disk base 9 and disk platforms 10 placed on its surface, rotating around their own axis, in which recesses are made for the installation of substrates. The module for supplying ionized gases includes sealed compartment 12 connected to reaction chamber 1 and separated from it by sealed hatch 15, inside which ion source 13 is installed with means of supplying ionized gases, made with the possibility of moving into the working space of reaction chamber 1 along rails 17 and intended for preliminary cleaning and/or activation of the substrate surface. The heater is a thermal cable connected to the substrate holder and placed in grooves made in disk platforms 10.
EFFECT: performance of the system is increased, ensuring the production of high-quality uniform coatings.
7 cl, 3 dwg
Title | Year | Author | Number |
---|---|---|---|
SUBSTRATE HOLDER AND INSTALLATION FOR APPLICATION OF COATING BY METHOD OF MAGNETRON SPUTTERING ON ITS BASE | 2010 |
|
RU2437964C2 |
METHOD OF SYNTHESIS OF TiN-Cu COMPOSITE COATINGS AND DEVICE FOR ITS IMPLEMENTATION | 2017 |
|
RU2649355C1 |
UHF PLASMA REACTOR WITH REGULATION OF TEMPERATURE OF INDIRECT SUBSTRATE HEATING | 2019 |
|
RU2762222C1 |
METHOD FOR APPLYING METAL COATING FROM MATERIAL SUBJECT TO ACTIVE OXIDATION IN AIR ATMOSPHERE, AND DEVICE FOR ITS IMPLEMENTATION | 2021 |
|
RU2757882C1 |
METHOD OF OBTAINING EPITAXIAL LAYER OF BINARY SEMICONDUCTOR MATERIAL ON MONOCRYSTALLINE SUBSTRATE BY ORGANOMETALLIC CHEMICAL VAPOUR DEPOSITION | 2013 |
|
RU2548578C2 |
METHODS USING REMOTE ARC DISCHARGE PLASMA | 2013 |
|
RU2640505C2 |
METHOD FOR OBTAINING ORIENTED FLUORIDE COATINGS FROM GAS PHASE | 2008 |
|
RU2405857C2 |
METHOD OF MAKING THIN FILMS OF CHEMICAL COMPOUNDS AND INSTALLATION FOR REALISING SAID METHOD | 2008 |
|
RU2388770C2 |
APPARATUS FOR APPLICATION OF COATINGS | 0 |
|
SU1125291A2 |
METHOD OF OBTAINING TWO-SIDED SUPERCONDUCTOR OF SECOND GENERATION | 2008 |
|
RU2386732C1 |
Authors
Dates
2022-03-22—Published
2020-12-14—Filed