FIELD: ceramics.
SUBSTANCE: used for highly efficient cleaning of substrates made of high-frequency ceramic materials. A method for cleaning microwave dielectric substrates made of high-frequency ceramic materials based on barium titanate, aluminum nitride or aluminum oxide includes wiping the substrates with calico napkins moistened with ethyl alcohol, cleaning in an ultrasonic bath in acetone for 10-15 minutes, followed by washing in a deionized water for 10-20 minutes, cleaning in chromium for 10-15 minutes, followed by washing in deionized water for 10-20 minutes, plasma-chemical cleaning in a working environment of a mixture of argon and oxygen gases in a ratio of 1:4 for 5-50 minutes at an installation power of 200-1500 W, measurement of the contact angle of wetting on a test workpiece, confirming the achievement of the required surface cleanliness of 2-4°.
EFFECT: production of dielectric substrates of increased purity with a contact angle of 2-4°.
1 cl, 5 tbl
