DIFFUSION WELDING MACHINE Russian patent published in 2023 - IPC B23K20/14 

Abstract RU 2809742 C1

FIELD: semiconductors.

SUBSTANCE: invention relates to devices for producing composite structures with semiconductor substrates under electrothermal action and can be used to create a mechanically strong metal electrode base with single-crystal and porous semiconductor substrates. Heaters and a conductive clamping mechanism 2 are located inside the heating chamber. A vacuum pump, a temperature control module and a pressure control module are connected to the heating chamber. A thermobox for the welded sample is installed in the chamber. The welding process control unit is connected to the clamping mechanism and supplies the connecting voltage. The clamping mechanism is configured for interaction with the thermobox 18 and comprises a metal anchor 16, equipped with a conductive pressure plate 17, and a microscrew 15 connected by means of a spring to the metal anchor.

EFFECT: increase in the uniformity of heating of the samples and the connecting voltage applied to them.

6 cl, 7 dwg

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RU 2 809 742 C1

Authors

Belorus Anton Orestovich

Pleshanov Ilya Mikhajlovich

Koshevoj Veniamin Leonovich

Timchenko Aleksandr Vladimirovich

Kozodaev Dmitrij Aleksandrovich

Kuznetsov Evgenij Vladimirovich

Korepanov Oleg Alekseevich

Yakovleva Anastasiya Aleksandrovna

Dates

2023-12-15Published

2023-01-24Filed