FIELD: technological processes.
SUBSTANCE: group of inventions relates to a method of depositing a material in the form of a chromium-based oxidation-protective layer from a target on metal substrates and a method for manufacturing a cladding of nuclear fuel elements using said deposition method. In a vacuum casing with metal substrates placed in it, a stream of gas ions is directed to said substrates, obtained using a plasma source when a bias voltage is applied to metal substrates −50 V to −100 V, and a stream of neutral chromium atoms is directed to metal substrates. Said flux of chromium atoms is obtained by continuous magnetron sputtering of the target with deposition of said material. Ratio between the flow of gas ions directed towards the metal substrates and the flow of neutral chromium atoms towards the metal substrates ranges from 0.5 to 1.7.
EFFECT: providing a chromium-based layer with density at least equivalent to that of the layer obtained using deposition techniques given in the prior art.
12 cl, 9 dwg, 1 tbl
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Authors
Dates
2024-10-07—Published
2022-03-21—Filed