COMPOSITION FOR POSITIVE PHOTORESIST REMOVAL Russian patent published in 1995 - IPC

Abstract SU 1653442 A1

FIELD: semiconductors production. SUBSTANCE: composition to remove positive photoresist, that is composed of methylpyrrolidone and water, additionally has glycerin and alyphatic amine with following ratio of ingredients, vol. %: methylpyrrolidone 17 -82; glycerin 10 - 20; alyphatic amine 2 - 25; water - the rest. EFFECT: increased efficiency of process due to increase of quality and speed of photoresist removal, tanned under temperature of over 150 C. 2 tbl

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SU 1 653 442 A1

Authors

Pimkina Z.A.

Gunina N.M.

Pojarkov I.I.

Dynnik A.P.

Mandrykina G.A.

Dates

1995-04-30—Published

1989-10-31—Filed