COMPOSITION FOR POSITIVE PHOTORESIST REMOVAL Russian patent published in 1995 - IPC

Abstract SU 1734487 A1

FIELD: semiconductors production. SUBSTANCE: composition has methylpyrrolidone, water, glycerin and alyphatic amine with following ratio of ingredients, vol. %: methylpyrrolidone 17 -82; glycerin 10 - 20; alyphatic amine 0.01 - 25; water - the rest. EFFECT: ratio f ingredients of composition provides expansion of operational capabilities due to enhancement of quality and speed of photoresist removal, tanned under temperature of over 150 C. 3 tbl

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SU 1 734 487 A1

Authors

Pimkina Z.A.

Gunina N.M.

Mandrykina G.A.

Pojarkov N.I.

Dates

1995-04-30—Published

1990-07-20—Filed