FIELD: devices for application of quality films in vacuum used in electronic industry. SUBSTANCE: gas-discharge chamber of evaporator is made in the form of spiral embraced by body made of nonmagnetic material with profile of supersonic nozzle opened towards substrate. In this case initial parts of spiral are connected through inductive resistor to pulse generator, and spiral end is grounded. The evaporator design makes it possible to obtain flows of applied material with uniform distribution of material and velocity across nozzle cross-section with simple design of evaporator and increased service life. EFFECT: simplified design of device and increased reliability of its operation. 1 dwg
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