FIELD: plasma equipment. SUBSTANCE: invention can be used in electronics, radio engineering, instrumentation while designing integrated circuits of optoelectronic and optical devices and machining glasses of mirrors and lenses. System of excitation of electromagnetic field in super-high frequency discharger is manufactured in the form of two comb structures. Comb structures are mounted spirally on one of walls of resonator of rectangular shaped and are connected to one of two independent SHF generators. EFFECT: increased uniformity of distribution of density of flow of power of electromagnetic field over surface of generator plasma. 2 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| MICROWAVE PLASMA REACTOR | 2023 |
|
RU2804043C1 |
| HIGH-SPEED METHOD FOR DEPOSITING DIAMOND FILMS FROM GAS PHASE IN PLASMA OF SHF-DISCHARGE AND PLASMA REACTOR FOR PERFORMING THE SAME | 2002 |
|
RU2215061C1 |
| DEVICE FOR MICROWAVE VACUUM-PLASMA TREATMENT OF RIBBON-CARRIED CONDENSED MEDIA USING ELECTRONIC CYCLOTRON RESONANCE | 1999 |
|
RU2153733C1 |
| PLASMA MICROWAVE REACTOR | 2016 |
|
RU2637187C1 |
| MICROWAVE PLASMA REACTOR FOR GAS-PHASE DEPOSITION OF DIAMOND FILMS IN GAS FLOW (VERSIONS) | 2014 |
|
RU2595156C2 |
| MICROWAVE PLASMA CONVERTER | 2013 |
|
RU2522636C1 |
| METHOD OF PLASMA GENERATION AND DEVICE FOR ITS REALIZATION | 1999 |
|
RU2171554C2 |
| SHF PLASMA REACTOR FOR CHEMICAL PROCESSES | 1988 |
|
RU1602376C |
| SHF PLASMA-CHEMICAL REACTOR | 1999 |
|
RU2149521C1 |
| DEVICE FOR MICROWAVE FIRING OF GAS-DISCHARGE LASER AND FOR LASING PROCESS MAINTENANCE BY PRODUCING COAXIAL PLASMA LINE | 1999 |
|
RU2164048C1 |
