FIELD: alloy working. SUBSTANCE: method involves successive ionic clearing, nitrogen implantation at energy 40-100 keV, current density 1-5 mA/1-5mA/cm2 and dose 1019-2·1019 ions/ion/cm2, ionic alloying with boron or rare-earth elements ( Y, La, Sm, Yb, etc. ) at energy 30-100 keV, current density 20-100 mcA/mkA/cm2, dose 5·1016- ions/1017ion/cm2 and stabilizing annealing at 450-650 C under vacuum 1·10-3-5·10-3 for 1,5-2 h. EFFECT: improved exploitation properties. 6 dwg, 1 tbl
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