FIELD: integrated circuit manufacturing technique. SUBSTANCE: method involves connection of two silicon plates using contact layer of following composition, mol percent: silicon dioxide obtained by chemicoplasma method - 0.077T-14.216; boron oxide - the rest up to 100%, where T is borosilicate compound synthesis temperature. Heat treatment is conducted in homogeneous gaseous medium. EFFECT: facilitated procedure. 4 dwg
Authors
Dates
1994-10-30—Published
1992-06-04—Filed