FIELD: manufacture of integrated circuits with insulated components. SUBSTANCE: silicon substrates are joined together; joining layer incorporates polycrystal silicon, silicon dioxide layer, borosilicate system compositions obtained by synthesis from boron oxide solution in organic medium. Structure is subjected to heat treatment in oxygen medium in three stages: degassing, dewatering at 320-410 C, and formation of crystallization centers at 850-995 C followed by synthesis of joining layer at 1170-1220 C. EFFECT: facilitated procedure. 4 dwg
Authors
Dates
1994-10-30—Published
1992-06-04—Filed