FIELD: optoelectronics. SUBSTANCE: infrared semiconductor radiator has active narrow-zone layer with bipolar conductance with thickness comparable with diffusion length, wide-zone substrate, antireflection and focusing layers. Ohmic contacts are made on active layer. Doped layer with concentration of impurities determined by expression specified in description of invention is formed on radiation surface. EFFECT: improved operational characteristics. 1 dwg
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Authors
Dates
1994-12-30—Published
1991-04-22—Filed