DEVICE FOR PLATING IN VECUUM APPARATUSES Russian patent published in 1995 - IPC

FIELD: plating. SUBSTANCE: problem on producing plating layers under selected law of thickness distribution for substrates of any spatial shape when the substrate enables to be turned concurrently and independently about three coordinate axes, and one on improving content of residual gaseous medium are the bases of the invention. These problems are resolved also by the way when revolving mechanism of substrate holder is made in the form of two movable frames, with one installed in another in their supports, and they may be turned by two electric motors. One motor is installed on external movable frame, and another is fixed immovable in the chamber. A motor and the substrate holder secured on its shaft is installed in internal movable frame. Surfaces of the chamber and rotary mechanism facing the vacuum space are sandblasted. EFFECT: ecologically clean process device. 1 dwg