METHOD OF VACUUM DEPOSITION OF COATINGS Russian patent published in 1995 - IPC

FIELD: coating deposition in vacuum. SUBSTANCE: method of vacuum deposition of coating comprises steps of depositing ions of coating onto a substrate, applying layer-by-layer components of coating in sign-variable magnetic field up to thickness (1-10)micrometers of layer of the coating upon reversing rotation of the substrate around its own axis with an amplitude, depending upon properties of the magnetic system; applying components of cathode according to their decreased activity; depositing aluminium oxide with thickness of its layer, being at least 1 micrometer, between the layers of surface of the substrate and the coating and also between a pair of layers of coating, being deposited; periodically separating an annular magnetic field by sector zones at each cycle of direct and reverse stroke of the substrate, being rotated. EFFECT: enhanced quality and accuracy of deposited coating. 2 cl