VACUUM ARC PLASMA SOURCE Russian patent published in 1996 - IPC

FIELD: vacuum deposition of coating, in particular, deposition of coating on elongate and large-sized products. SUBSTANCE: vacuum arc plasma source has magnetic stabilization static system and is further provided with magnetic stabilization dynamic system. Both magnetic systems are provided with mutually perpendicular linear conductors. Dynamic system linear conductors are divided into sections and connected to current source through commutator, which provides alternate connection of linear conductors. Cathode of plasma source is made in the form of rectangular plate. Magnetic system allows cathode spots making plasma source to be retained on end working surface of cathode. EFFECT: increased efficiency and improved quality of coating. 4 cl, 4 dwg, 1 tbl